1

Growth and properties of fluorinated plasma oxide for Si MOSFET devices

Year:
2008
Language:
english
File:
PDF, 165 KB
english, 2008
2

Channel Reliability in MOSFETs with Gate Oxide Grown using ECR Plasma of O2/He

Year:
2007
Language:
english
File:
PDF, 186 KB
english, 2007